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Cas No. 352535-01-4 Tetrakis(ethylmethylamino)hafnium

Chemical Name: Tetrakis(ethylmethylamino)hafnium
Molecular Type: C12H32HfN4
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Hafnium based amino metal compounds are mainly used as raw materials for CVD and ALD, as precursors for depositing hafnium and preparing hafnium oxide thin films. It can also be used as a high K insulation material for COMS’s next-generation DRAM, widely used in advanced CMOS integrated circuit technologies such as 45nm and 7nm technology bands. It can also be used in the research of new resistive/memristive devices (RRAM) and exhibits good miniaturization characteristics, maintaining good resistive characteristics at the 10nm scale.

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