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Cas No. 75-24-1 Trimethylaluminium

Chemical Name: Trimethylaluminium
Molecular Type: C3H9Al
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Trimethylaluminum can be used in semiconductor manufacturing to deposit aluminum oxide layers and aluminum nitride, as a dielectric for DRAM capacitors and high k gate dielectrics; In OLED film packaging, it can be used for water vapor barrier film coating and gas diffusion barrier membrane production; It can also be used as a passivation layer on the silicon surface in solar cells.

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